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Uttarakhand's First Nanofabrication Facility: A Leap in Semiconductor Manufacturing

Uttarakhand's First Nanofabrication Facility: A Leap in Semiconductor Manufacturing
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Uttarakhand's First Nanofabrication Facility: A Leap in Semiconductor Manufacturing

AspectDetails
EventEstablishment of Uttarakhand's First Nanofabrication Facility
LocationIIT-Roorkee, Uttarakhand
Collaboration- International: Taiwan's premier semiconductor institutions
- Domestic: Funded by the Department of Science and Technology (DST)
Project Start Year2019
Key Infrastructure- 50 kV Electron Beam Lithography (EBL) system with 10nm resolution
- Inductively Coupled Plasma RIE (ICP-RIE)
- Ultra-clean rooms: Class 100 space (300 sq ft) and Class 1000 space (600 sq ft)
Research Applications- Quantum sensors, Spintronics, Memory devices, Thin-film devices, Photodetectors, Quantum optics, Photonic crystals
About DST- Founded on 3rd May 1971
- Functions: Funding, policy-making, international scientific coordination
- Supports scientists, institutions, and stakeholders in Science & Technology
- DST's budget has increased by 100% over the years, enabling new initiatives

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